Sputtering systemAurion
B-VPA-28
Sputtering system
Aurion
B-VPA-28
Bouwjaar
2019
Toestand
Gebruikt
(volledig functioneel)
Locatie
Gießen 

Basisgegevens
- Machinetype:
- Sputtering system
- Producent:
- Aurion
- Model:
- B-VPA-28
- Bouwjaar:
- 2019
- Toestand:
- gebruikt
- Functionaliteit:
- volledig functioneel
Prijs & locatie
- Locatie:
- Margaretenhütte 57, 35398 Gießen, Deutschland

Bellen
Details over het aanbod
- Advertentie-ID:
- A232-96293
- Laatste aanpassing:
- voor het laatst op 06.11.2026
Omschrijving
Sputtering System – Aurion Plant Technology
Manufacturer: Aurion Plant Technology
System Type: B-VPA-28
Serial Number: 302343
Technical Data and Equipment
The sputtering system has a total weight of approximately 7,000 kg and dimensions of 6,217 × 3,500 × 2,100 mm (W × D × H), each without vacuum pumps. The chamber volume is approximately 670 liters. The maximum ambient temperature is 25 °C.
The electrical mains connection is with 400/230 V at 50 Hz. The connection power is approximately 100 kVA with a current draw of approximately 125 A.
Chodpfx Aij Ah Tlgo Eed
Substrate and Heating System
Substrate dimensions: 38 × 31 × 1.08 mm
Transport pallets: 416.9 × 504.5 mm
Capacity: 144 substrates per transport pallet
Substrate heating up to a maximum of 250 °C
Vacuum and Process Gas System
Achievable final pressure: < 1 × 10⁻⁷ hPa
Process gas: Argon
2 Bronkhorst F-201CS flow controllers, each with 500 mln/min
Coating System
2 DC generators ADL GX 150/800, each with 15 kW
Vacuum components (Pfeiffer Vacuum)
4 × Roughing pump DUO 35
2 × Roughing pump DUO 65
2 × Rotary vane pump Okta 500
3 × Turbo pump HiPace 1200 U
1 × Turbo pump HiPace 2300 U
Valve technology from VAT
Control and Automation Technology
The system control is based on a Siemens SIMATIC S7 controller and includes a panel PC with WinCC for operation and process visualization.
De advertentie werd automatisch vertaald. Vertaalfouten zijn mogelijk.
Manufacturer: Aurion Plant Technology
System Type: B-VPA-28
Serial Number: 302343
Technical Data and Equipment
The sputtering system has a total weight of approximately 7,000 kg and dimensions of 6,217 × 3,500 × 2,100 mm (W × D × H), each without vacuum pumps. The chamber volume is approximately 670 liters. The maximum ambient temperature is 25 °C.
The electrical mains connection is with 400/230 V at 50 Hz. The connection power is approximately 100 kVA with a current draw of approximately 125 A.
Chodpfx Aij Ah Tlgo Eed
Substrate and Heating System
Substrate dimensions: 38 × 31 × 1.08 mm
Transport pallets: 416.9 × 504.5 mm
Capacity: 144 substrates per transport pallet
Substrate heating up to a maximum of 250 °C
Vacuum and Process Gas System
Achievable final pressure: < 1 × 10⁻⁷ hPa
Process gas: Argon
2 Bronkhorst F-201CS flow controllers, each with 500 mln/min
Coating System
2 DC generators ADL GX 150/800, each with 15 kW
Vacuum components (Pfeiffer Vacuum)
4 × Roughing pump DUO 35
2 × Roughing pump DUO 65
2 × Rotary vane pump Okta 500
3 × Turbo pump HiPace 1200 U
1 × Turbo pump HiPace 2300 U
Valve technology from VAT
Control and Automation Technology
The system control is based on a Siemens SIMATIC S7 controller and includes a panel PC with WinCC for operation and process visualization.
De advertentie werd automatisch vertaald. Vertaalfouten zijn mogelijk.
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